Soluble Photosensitive Polyimide Precursor with Bisphenol A Framework: Synthesis and Characterization

Area of Science:

• Polymer Chemistry
• Materials Science
• Organic Synthesis

Background:

• Development of advanced polymer films with tailored properties is crucial for various technological applications.
• Photosensitive polyimides offer unique processing advantages, enabling precise patterning and fabrication.
• Improving the mechanical robustness of photosensitive polyimides without compromising transparency is an ongoing challenge.

Purpose of the Study:

• To synthesize a novel soluble photosensitive polyamide ester precursor (BAFPAE).
• To investigate the effects of reaction conditions and functional group incorporation on film properties.
• To evaluate the mechanical performance and potential applications of the resulting transparent photosensitive polyimide film.

Main Methods:

• Copolymerization of 2,2-bis [4-(4-aminophenoxy)phenyl]hexafluoropropane (HFBAPP) and 4,4'-(4,4'-isopropylidenediphenoxy)bis(phthalic anhydride) (BPADA).
• Incorporation of hydroxyethyl methacrylate (HEMA) as a photosensitive functional group.
• Thermal curing of the precursor film to obtain a transparent polyimide film and systematic investigation of mechanical properties.

Main Results:

• A soluble photosensitive polyamide ester precursor (BAFPAE) was successfully synthesized.
• The formation of polyacrylate-polyimide interpenetrating polymer networks (IPNs) was confirmed.
• The optimized BAF-x-y film exhibited superior mechanical properties: toughness (12.69 MJ m^3), Young's modulus (2.86 GPa), elongation at break (21.16%), and tensile strength (92.68 MPa).

Conclusions:

• The developed BAFPAE precursor enables the fabrication of transparent photosensitive polyimide films.
• The incorporation of HEMA and the formation of IPNs are key to achieving excellent mechanical integrity.
• The material shows significant promise for applications requiring robust and photosensitive polymer films.